| 摘要 |
PROBLEM TO BE SOLVED: To provide a removing/washing method and a removing/washing device by which an organic thin film and contaminants on the surface of a substrate can be removed at a high peel removing rate, treatment suitable to a horizontally transporting treatment for a large-sized substrate can be performed, displacement and the production amount of by-products are reduced, a load to the natural environment is reduced, and operation can be performed at a low cost. SOLUTION: An electric field is applied to a water vapor-containing radical raw material gas to generate a gas containing a hydroxy group free radical in a high concentration. The gas is fed to the surface of a substrate, and an organic thin film and contaminants on the surface of the substrate are removed. COPYRIGHT: (C)2005,JPO&NCIPI
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