| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for the spin coating of a substrate, whereby even when the substrate is rectangle or curved, the unevenness of coating with a coating fluid is suppressed, and the coating fluid is prevented from spreading onto the back of the substrate and to provide a method for spin coating. SOLUTION: In a spin coater which is an apparatus used for applying a coating fluid to a substrate by a spin coating method and is provided with a mechanism having a pedestal that supports and rotates the substrate, spreads the coating fluid applied to the substrate in the direction of the outside of the substrate by the centrifugal force of spin rotation, and sucks the extra coating fluid staying near the end from the periphery of the substrate, the pedestal is covered with a nearly recessed cross section body that is near to the pedestal and the substrate and rotates together with the pedestal, the nearly recessed cross section body is connected with a suction pump, and the suction pump sucks the atmosphere around the end of the substrate through a suction path being the clearance formed between the pedestal and the nearly concave cross section body. COPYRIGHT: (C)2005,JPO&NCIPI
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