发明名称 |
APPARATUS FOR CONSECUTIVE DEPOSITION OF HIGH-TEMPERATURE SUPERCONDUCTING (HTS) BUFFER LAYERS |
摘要 |
The present invention is a deposition system for the production of coated substrates that provides a first deposition process that subsequently feeds a second deposition process and where the two deposition processes are occurring concurrently. The consecutive deposition system includes two dynamically isolated deposition chambers. The substrate is helically wrapped about a cooling block within the first deposition chamber such that the tape is exposed to a deposition zone a number of times sufficient to correspond to the desired film thickness. A shielding element may be included in the second deposition chamber to limit the size of the second chamber deposition zone and thus the film thickness of the second coating layer. |
申请公布号 |
WO2005006350(A2) |
申请公布日期 |
2005.01.20 |
申请号 |
WO2004US16632 |
申请日期 |
2004.05.25 |
申请人 |
SUPERPOWER, INC. |
发明人 |
SELVAMANICKAM, VENKAT;SATHIRAJU, SRINIVAS |
分类号 |
B05D5/12;C23C14/00;C23C14/32;C23C14/34;C23C14/56;C23C16/00;C25B9/00;C25B11/00;C25B13/00;H01B;H01L39/24 |
主分类号 |
B05D5/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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