发明名称 PROCESS FOR PRODUCING PLASMA DISPLAY PANEL AND APPARATUS THEREFOR
摘要 <p>A production process in which a metal oxide film of high quality is formed on a substrate of plasma display panel. In the step of forming protective layer (8) consisting of an MgO film as a metal oxide film, film formation is carried out while controlling the partial pressure of, for example, oxygen gas in vapor deposition chamber (21) as a film forming chamber within a given range. Thus, due to the film formation with the atmosphere in vapor deposition chamber (21) controlled so as to be constant, the properties of obtained film can be stabilized and a plasma display panel capable of realizing high-quality image display can be produced.</p>
申请公布号 WO2005006380(A1) 申请公布日期 2005.01.20
申请号 WO2004JP10356 申请日期 2004.07.14
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.;TAKASE, MICHIHIKO;OE, YOSHINAO 发明人 TAKASE, MICHIHIKO;OE, YOSHINAO
分类号 H01J9/02;(IPC1-7):H01J9/02;H01J11/02 主分类号 H01J9/02
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