| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a phase shift mask for preventing the occurrence of a concave defect in a light transmitting part in the main pattern or in an auxiliary pattern by forming the main pattern and the auxiliary pattern in separated processes, to provide a phase shift mask, and to provide a method for transferring a pattern by using the phase shift mask. <P>SOLUTION: First, a main pattern 51a comprising an engraved transparent substrate 11 is formed in a phase shift mask blank 10 having a halftone phase shift film 21 consisting of MoSi or the like and a light shielding film 31 comprising a chromium film on a transparent substrate 11 such as a quartz substrate. Further, an auxiliary pattern 61 is formed, a halftone phase shift region 21a and a light shielding region 31 are formed to obtain the phase shift mask 100. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
