| 摘要 |
PROBLEM TO BE SOLVED: To provide a technique capable of suppressing unevenness of exposure to a desired extent even if an X-ray taking-out window is not enlarged when the X-ray taking-out window is moved during exposure. SOLUTION: A Be (beryllium) window is made movable in the two dimensional X, Y directions, and the Be window is so moved that the unevenness of exposure in the exposure region become smallest. The Be window which has hitherto been moved along a straight line is moved in the two dimensional directions in a plane perpendicular to the X-ray optical axis. Thus, the X-rays transmitted through a finite region on the XY plane of the Be window reach one point on a wafer, so that the unevenness of the Be film is averaged in the finite region. COPYRIGHT: (C)2005,JPO&NCIPI |
