发明名称 Cutting method and method of manufacturing semiconductor device
摘要 A cutting method for separating individual semiconductor devices by cutting boundary portions in a group of semiconductor devices made up by arranging a plurality of semiconductor devices in which a ductile first layer and a second layer are stacked on a peripheral side thereof, the cutting method comprises a cutting step of cutting the first and second layers by moving a first rotary body from the boundary portions of the group of semiconductor devices in the direction in which the first and second layers are stacked; and a burr removal step of removing burrs from the first layer by moving a second rotary body, softer than the first rotary body and wider than the first rotary body in the direction of rotational axis, from the cut boundary portions of the group of semiconductor devices in the direction in which the first and second layers are stacked.
申请公布号 US2005012193(A1) 申请公布日期 2005.01.20
申请号 US20040892398 申请日期 2004.07.16
申请人 KAMEYAMA KOUJIRO;MITA KIYOSHI 发明人 KAMEYAMA KOUJIRO;MITA KIYOSHI
分类号 H01L21/301;H01L21/48;H01L21/56;H01L21/68;H01L23/31;(IPC1-7):H01L29/74 主分类号 H01L21/301
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