发明名称 |
Schottky contact used in the production of electronic components comprises an insulating protective layer arranged on an insulating layer and in a protective region lying next to a metal-semiconductor transition |
摘要 |
<p>Schottky contact comprises an insulating protective layer (104) arranged on an insulating layer (314) and in a protective region (102) lying next to a metal-semiconductor transition. An independent claim is also included for a process for the production of a Schottky contact.</p> |
申请公布号 |
DE10344749(B3) |
申请公布日期 |
2005.01.20 |
申请号 |
DE2003144749 |
申请日期 |
2003.09.25 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
POMPL, STEFAN |
分类号 |
H01L29/47;H01L29/872;(IPC1-7):H01L29/47;H01L21/283 |
主分类号 |
H01L29/47 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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