发明名称 Substrate for magnetic recording medium, method for manufacturing the same and magnetic recording medium
摘要 Provided is a substrate for a magnetic recording medium, preferably a substrate having a small diameter of not more than 65 mm, which is advantageous in respect of physical properties and cost. More specifically, provided is a substrate for a magnetic recording medium, using a monocrystalline silicon wafer which has been heated and/or etched at least once before. Moreover, provided is a method for manufacturing a substrate for a magnetic recording medium, the method comprising a step of coring for obtaining a plurality of doughnut-shaped substrates having an outer diameter of not more than 65 mm from a monocrystalline silicon wafer having a diameter of at least 150 mm and at most 300 mm which has undergone heating and/or etching at least once. The method may preferably further comprise a step of chamfering for removing edges of inner and outer circumferential faces of said doughnut-shaped substrate; and a step of circumferential face-polishing for polishing the chamfered inner and outer circumferential faces.
申请公布号 US2005011860(A1) 申请公布日期 2005.01.20
申请号 US20040886769 申请日期 2004.07.08
申请人 ISHII MASATOSHI;TSUMORI TOSHIHIRO;OHASHI KEN 发明人 ISHII MASATOSHI;TSUMORI TOSHIHIRO;OHASHI KEN
分类号 B44C1/22;C03C25/68;C30B29/06;C30B29/60;C30B33/00;G11B5/62;G11B5/84;H01L21/76;(IPC1-7):B44C1/22 主分类号 B44C1/22
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