CYCLIC FLUORINE COMPOUNDS, POLYMERIZABLE FLUOROMONOMERS, FLUOROPOLYMERS, AND RESIST MATERIALS CONTAINING THE FLUOROPOLYMERS AND METHOD FOR PATTERN FORMATION

摘要

The invention provides cyclic fluorine compounds represented by the general formula (1): (1) (wherein R<1> is halogeno; and R<2> and R<3> are each hydrogen or a hydrocarbon group which is a straight-chain, branched, or cyclic C1-25 hydrocarbon group or an aromatic hydrocarbon group and may contain halogen, oxygen, nitrogen, or sulfur). The invention also discloses polymerizable fluoro- monomers derived from the above compounds; fluoropolymers obtained by polymerization or copolymerization of the above compounds or fluoromonomers; resist materials containing the fluoropolymers; and a method for pattern formation by using the fluoropolymers. The invention can provide polymers suitable for resist materials (particularly, vacuum-ultraviolet resist materials) which exhibit high transparency in a wide wavelength region of from ultraviolet region to near infrared region, high tight adhesion to substrates, excellent film-forming properties, high etching resistance, and high glass transition temperatures. Further, the method for pattern formation by using the fluoropolymers is suitable for the formation of high-resolution patterns.