| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition as a chemically amplified resist, which is, in particular, excellent in resolution for a contact hole as well as excellent in transparency for radiation, dry etching durability, pattern profile, sensitivity, resolution or the like. <P>SOLUTION: The radiation-sensitive resin composition contains: (A) a resin having an alicyclic skeleton in the main chain and/or the side chain; (B) a resin having ≥60 %/μm transmittance for radiation at 100 to 300 nm wavelength; and (C) a radiation-sensitive acid generating agent. At least one of the component (C) and the component (B) contains an acid-cleaving group. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
