发明名称 |
METHOD FOR FORMING FEATURE OF 50 NM OR LESS HALF-PITCH WIDTH BY USING CHEMICALLY AMPLIFIED RESIST IMAGING |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic imaging method for use in the manufacture of an integrated circuit composed of patterned structure or other similarly patterned structures of very high resolution, the patterned structure having especially a feature with a half pitch of about 50 nm or less. <P>SOLUTION: Lithographic imaging of a 50 nm (or less) half-pitch feature in a chemically amplified resist (usually used in the manufacture of an integrated circuit) is made possible by the use of reduced temperature post-exposure processing and a low activation energy chemically amplified resist. The post-exposure processing preferably involves ambient to moderately elevated temperature and the presence of a deprotection reaction-dependent co-reactant (e.g. water). <P>COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2005018063(A) |
申请公布日期 |
2005.01.20 |
申请号 |
JP20040183531 |
申请日期 |
2004.06.22 |
申请人 |
INTERNATL BUSINESS MACH CORP |
发明人 |
MEDEIROS DAVID R;HUANG WU-SONG;WALLRAFF GREGORY M;HINSBERG BILL;HOULE FRANCES |
分类号 |
G03F7/039;G03F7/00;G03F7/20;G03F7/26;G03F7/38;G03F7/40;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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