| 发明名称 |
MASK, METHOD FOR CONTROLLING EXPOSURE LIGHT QUANTITY, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To monitor the exposure light quantity in a phase shift mask. <P>SOLUTION: A plurality of blocks having a light shielding part and a light transmitting part arranged in one direction in a specified width p irresolvable by a projection exposure apparatus are intermittently or continuously arranged in the same direction as above. The dimensional ratio of the light shielding part to the light transmitting part in the block is monotonously varied, with about 180° phase difference in the exposure light passing the adjacent light transmitting parts. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
| 申请公布号 |
JP2005017689(A) |
申请公布日期 |
2005.01.20 |
| 申请号 |
JP20030182452 |
申请日期 |
2003.06.26 |
| 申请人 |
TOSHIBA CORP |
发明人 |
FUJISAWA TADAHITO;INOUE SOICHI;TANAKA SATOSHI;ASANO MASASHI |
| 分类号 |
G03B27/42;G03F1/26;G03F1/38;G03F1/44;G03F1/68;G03F1/70;G03F7/20;H01L21/027;H01L21/3205;H01L21/768;H01L23/52;H01L23/522 |
主分类号 |
G03B27/42 |
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