| 摘要 |
PROBLEM TO BE SOLVED: To provide a carbon nanotube film manufacturing apparatus of excellent mass productivity capable of manufacturing carbon nanotube films of uniformized directions and diameters in a short time. SOLUTION: Chlorine gas plasma 19 is generated by plasmatizing the inside of a chamber 1 with a substrate 3 stored therein, and a graphite-made member 11 to be etched is etched by chlorine radicals to generate precursor of carbon chloride in a gas phase. By setting the temperature on the substrate 3 side to be lower than the temperature on the etched member 11 side, carbon components of the precursor are deposited on the substrate 3 as a carbon nanotube film. COPYRIGHT: (C)2005,JPO&NCIPI
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