LIQUID RAW MATERIAL FEEDING DEVICE FOR CVD, CVD SYSTEM, AND METHOD FOR MANUFACTURING OXIDE SUPERCONDUCTOR

摘要

PROBLEM TO BE SOLVED: To provide a low-cost liquid raw material feeding device for CVD (Chemical Vapor Deposition) effectively preventing the feed of a liquid raw material to a vaporizer from being interrupted, therefore capable of stably performing the feed to a CVD reactor for a long time, and also excellent in maintainability. SOLUTION: The liquid raw material feeding device 10 for CVD is provided with three vaporizers 61 to 63, and three liquid pumps (liquid feeding means). Each vaporizer 61 to 63 is provided with liquid raw material feeders 30a to 30f by two pieces, respectively. The liquid pump P1 is connected to the liquid raw material feeder 30b of the vaporizer 61 and to the liquid raw material feeder 30c of the vaporizer 62. The liquid pump P2 is connected to the liquid raw material feeder 30d of the vaporizer 62 and to the liquid raw material feeder 30e of the vaporizer 62. The liquid pump P3 is connected to the liquid raw material feeder 30f of the vaporizer 63 and to the liquid raw material feeder 30a of the vaporizer 61. COPYRIGHT: (C)2005,JPO&NCIPI