发明名称 WET PROCESSOR
摘要 PROBLEM TO BE SOLVED: To provide a wet processor which prevents a re-adhesion due to a fact that a chemical liquid or a waterdrop adhered to a cup is dropped to a wafer by an air flow caused by a high-speed rotation in drying, and carries out a good wafer processing. SOLUTION: A guide 9 inclined to the rotational direction of a rotary body 4 is formed for guiding a liquid body adhered to a side wall 7 and the visor 8 of a cup 6, respectively. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005019675(A) 申请公布日期 2005.01.20
申请号 JP20030182369 申请日期 2003.06.26
申请人 TOSHIBA CORP 发明人 EZAKI AKIRA;HAMADA ETSUO
分类号 H01L21/306;H01L21/304;(IPC1-7):H01L21/304 主分类号 H01L21/306
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