EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE

摘要

An exposure apparatus is disclosed wherein an exposure of a substrate is carried out by forming an immersion region on a part of the substrate and projecting a pattern image onto the substrate through a liquid which forms the immersion region and a projection optical system. The exposure apparatus comprises a liquid supply mechanism having a feed opening arranged opposite to the surface of the substrate. A channel of the liquid supply mechanism is provided with a buffer space, and the liquid supply mechanism begins supply of the liquid to the feed opening after storing a certain amount of the liquid in the buffer space.