| 摘要 |
PROBLEM TO BE SOLVED: To provide a lighting fixture for obtaining irradiation patterns with high evenness by reducing light which leaks out of the target irradiation patterns in a combination of a reflecting plate and a lens varying the irradiation patterns. SOLUTION: The fixture has a reflecting plate 1 with a light source 9 disposed therein and a lens 2 disposed at an opening of the plate 1. Many unevenness parts 13 are formed on the surface of the lens 2 in parallel to one another and formed so that angles formed by normals P of unevenness faces against incident light entering into the lens 2 by reflecting at the plate 1 from a light source 9 and a light axis Q of the plate 1 is large at the center of the lens 2 and becomes smaller toward the periphery from the center of the lens 2. COPYRIGHT: (C)2005,JPO&NCIPI |
