| 摘要 |
PROBLEM TO BE SOLVED: To provide an immersion type exposure apparatus in which a liquid film can be sustained appropriately between the end part of a projection optical system and a substrate under exposure. SOLUTION: The immersion type exposure apparatus comprises a means for detecting disappearance of a liquid film between the end part of a projection optical system and an exposure substrate. COPYRIGHT: (C)2005,JPO&NCIPI
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