发明名称 MATERIAL FOR REMOVING CONTAMINANT IN GAS AND METHOD FOR MANUFACTURING THE MATERIAL
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a contaminant removing material by which a very small amount of a gaseous chemical contaminant existing in a gas, in particular a basic gas such as ammonia in the dry gas, can be removed effectively. <P>SOLUTION: One embodiment of this method for manufacturing the contaminant removing material comprises: a step to introduce a polymer side chain having a cation exchange group, a chelate group or a hydrophilic group onto a main chain of an organic macromolecular base material and obtain an organic macromolecular material; a step to deposit the metal ions of a metal salt on the cation exchange group, the chelate group or the hydrophilic group by bringing the metal salt into contact with the obtained organic macromolecular material; a step to oxidize the deposited metal ions and precipitate the obtained metal oxide in the form of fine particles ; and a step to treat the precipitated fine particles with an acid. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005013811(A) 申请公布日期 2005.01.20
申请号 JP20030179835 申请日期 2003.06.24
申请人 EBARA CORP 发明人 HARAKAWA HIROAKI;FUJIWARA KUNIO;SHIOZAWA MARI
分类号 B01D53/02;B01J20/26;(IPC1-7):B01D53/02 主分类号 B01D53/02
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