| 摘要 |
The invention relates to a composition comprising, for 100 parts by weight, 99-60 parts of a styrenic polymer (A), 1-40 parts of (B)+(C), (B) being a polyamide block and polyether block copolymer essentially comprising ethylene oxide patterns (C2H4-O)-, (C) being a compatibilizer of styrene and at least one polymerized block comprising ethylene patterns, (B)/(C) ranging from 2 to 10.
|
