发明名称 Wafer applied thermally conductive interposer
摘要 A thermally conductive film is attached to an integrated circuit (IC) wafer through a number of steps. Initially, a thermally conductive film is positioned on a first side of a block. Next, an IC wafer that includes a plurality of chips is positioned with its non-active side in contact with the film. Then, a first surface of an elastomer pad is positioned in contact with an active side of the wafer. Next, a predetermined pressure is applied between a second side of the block that is opposite the first side and a second surface of the elastomer pad that is opposite the first surface. Finally, the film, the block, the wafer and the elastomer pad are heated to a predetermined temperature for a predetermined time while a predetermined pressure is applied to bond the film to the wafer without bonding the film to the block.
申请公布号 US2005014312(A1) 申请公布日期 2005.01.20
申请号 US20030618953 申请日期 2003.07.14
申请人 BRANDENBURG SCOTT D.;LAUDICK DAVID A. 发明人 BRANDENBURG SCOTT D.;LAUDICK DAVID A.
分类号 C09K5/14;H01L23/373;(IPC1-7):H01L21/48;H01L21/44;H01L21/50 主分类号 C09K5/14
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