LINKING UNIT, EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE

摘要

An exposure apparatus is disclosed wherein an exposure of a substrate is carried out by filling the space between a projection optical system and the substrate with a liquid and projecting a pattern image onto the substrate through the projection optical system and the liquid. The projection optical system comprises a first group including an optical member which is in contact with the liquid, and a second group which is different from the first group. The first group is supported by a first supporting member, while the second group is separately supported by a second supporting member which is different from the first supporting member.