发明名称 ABRASIVE CLOTH AND POLISHING METHOD
摘要 <p>An abrasive ground fabric which is a composite ground fabric comprising a fiber substrate and a elastic polymer filled in the fiber substrate, wherein (1) the fiber substrate is composed of bundles, each consisting of 20 to 3,000 fine fibers, and (2) the average diameter (D1) of fine fibers existent in a center portion from the center of the cross section perpendicular to a lengthwise direction of each bundle to ½ of the radius of each bundle is 0.3 to 10 mum, the average diameter (D2) of fine fibers existent in a peripheral portion from ½ of the radius to the end of each bundle is 0.05 to 1 mum, and the D1/D2 ratio is 1.5 or more. According to the present invention, the abrasive ground fabric is suitably used for the texturing of a substrate in the production of a magnetic recording medium, particularly a hard disk, enables high-accuracy surface finish and has excellent strength.</p>
申请公布号 EP1340588(A4) 申请公布日期 2005.01.19
申请号 EP20010999457 申请日期 2001.11.30
申请人 TEIJIN LIMITED 发明人 TANAKA, MANABU;SUZUKI, YOSHIYUKI;KITAWAKI, SHUSUKE;MIMURA, MASAHISA
分类号 B24B37/00;B24B37/20;B24B37/24;B24D11/00;C08G18/08;C08G18/66;D04H1/46;D04H1/48;D06M15/564;D06M15/568;D06M23/10;D06N3/00;G11B5/84;(IPC1-7):B24B37/00;D06M15/70;B24B19/02 主分类号 B24B37/00
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