APPARATUS AND METHOD FOR DETECTING PARTICLES ON WAFER TO PREVENT YIELD FROM BEING DETERIORATED BY PHOTORESIST PARTICLES

摘要

PURPOSE: An apparatus for detecting particles on a wafer is provided to prevent yield from being deteriorated by photoresist particles by inversely using an optical absorption phenomenon of photoresist and by detecting residual photoresist. CONSTITUTION: An original wafer(9) as a reference of comparison is placed in an installation chamber(11) installed in an inspection chamber(1). A detection unit irradiates detection light to the wafer placed on an inspection table(3) to detect photoresist particles and transfer an electrical signal according to inspection light reflected from the wafer, installed in the inspection chamber. An exhaust unit makes the inside of the inspection chamber vacuum. A control unit(C) stores an electrical signal transferred from the detection unit with respect to the original wafer and compares the electrical signal transferred from the detection unit with respect to a measured wafer(7) with the stored signal of the original wafer to control fabrication of the measured wafer according to the photoresist particles on the measured wafer.