Substrate holder and lithographic projection apparatus

摘要

A lithographic projection apparatus comprising: a radiation system (Ex,IL) for providing a projection beam (PB) of radiation; a support structure (MT) for supporting patterning means (MA), the patterning means serving to pattern the projection beam according to a desired pattern; a substrate holder (1) comprising a plurality of protrusions (2) defining a protrusion configuration for providing a substantially flat plane of support for supporting a substantially flat substrate (W), the substrate holder comprising at least one clamping electrode (8) for generating an electric field, for clamping a substrate against the substrate holder by said electric field; the substrate holder further comprising a peripheral supporting edge (3) arranged to contact a substrate; and a projection system (PL) for projecting the patterned beam onto a target portion of the substrate. According to the invention, the said at least one electrode extends beyond said peripheral supporting edge.