发明名称 Semiconductor device and method of manufacturing the same
摘要 A semiconductor device Having: a semiconductor substrate; a first gate electrode constructed of a multi-layered stack member provided in a memory region, formed with memory cells, so that the first gate electrode is insulated by a first insulating layer from the semiconductor substrate; and a second gate electrode provided in a logic region, formed with a logic circuit for controlling at least the memory cells, so that the second gate electrode is insulated by a second insulating layer from a semiconductor substrate, wherein said layer, brought into contact with the first insulating layer, of the first gate electrode and the layer, brought into contact with the second insulating layer, of the second gate electrode, are composed of materials different from each other, and a method for making the same.
申请公布号 US6844247(B2) 申请公布日期 2005.01.18
申请号 US20030368573 申请日期 2003.02.20
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 INABA SATOSHI
分类号 H01L21/28;H01L21/265;H01L21/336;H01L21/8234;H01L21/8242;H01L27/088;H01L27/10;H01L29/423;H01L29/43;H01L29/49;H01L29/78;(IPC1-7):H01L21/20;H01L21/36 主分类号 H01L21/28
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