| 摘要 |
A polymer comprising recurring units of formula (1) wherein R<1 >is H or methyl, R<2 >is H or C1-8 alkyl, R<3 >is CO2R<4>, and R<4 >is C1-15 alkyl and recurring units having a carboxylic acid protected with an acid-decomposable protecting group containing an adamantane structure or tetracyclo-[4.4.0.1<2,5>.1<7,10>]dodecane structure and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution and etching resistance and lends itself to micropatterning with electron beams or deep-UV
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