发明名称 |
APPARATUS FOR FORMING THIN FILM, PARTICULARLY REGARDING TO REGULARLY MAINTAINING UNIFORMITY OF THIN FILM FORMATION |
摘要 |
PURPOSE: An apparatus for forming a thin film is provided to regularly maintain the uniformity of thin film formation by actively coping with a change in shape of a glass. CONSTITUTION: A gas diffusing device is installed in a chamber for supplying reaction gas and forming an upper electrode. A suscepter(50) is formed under the gas diffusing device, and in which a glass(40) is mounted. A gas exhaust part exhausts reaction-completed exhaust gas. The gas diffusing device includes a shower head diffusing the reaction gas into the chamber. The suscepter has a close contact part(52) formed at an upper side to increase a contact area, having a plurality of protrusions.
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申请公布号 |
KR20050006527(A) |
申请公布日期 |
2005.01.17 |
申请号 |
KR20030046377 |
申请日期 |
2003.07.09 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KANG, HO MIN;KANG, SUNG CHUL;MIN, HOON KEE;YANG, SUNG HOON |
分类号 |
G02F1/13;(IPC1-7):G02F1/13 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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