BAFFLE PLATE AND PLASMA GENERATING APPARATUS INCLUDING THE SAME TO MORE SMOOTHLY PERFORM PLASMA PROCESS AND INCREASE EXHAUSTED QUANTITY

摘要

PURPOSE: A plasma generating apparatus including a baffle plate is provided to more smoothly perform a plasma process and increase an exhausted quantity by quickly and efficiently exhausting the exhaust gas or byproducts generated in a plasma process. CONSTITUTION: A plurality of slots(11) for exhausting exhaust gas or byproducts are formed in a baffle plate(10) installed in a plasma generating chamber. The plurality of slots of the baffle plate extends as a curve type from the vicinity of the inner circumference of the baffle plate toward the outer circumference of the baffle plate, having predetermined widths, respectively.