APPARATUS FOR DETECTING INFORMATION OF SUBSTRATE PROCESS BY PLASMA TO IMPROVE MECHANICAL STABILITY AND PROCESS REPEATABILITY

摘要

PURPOSE: An apparatus for detecting information of a substrate process by plasma is provided to improve mechanical stability and process repeatability by observing the state of chamber through a hole formed in the chamber by the naked eye while performing EPD(end point detector) measurement with respect to the light emitted from plasma. CONSTITUTION: A quartz(140) is composed of a body part, a step part and a protrusion stage wherein the body part is inserted into a hole formed in the wall of a chamber(100). A high frequency shield window(130) has a hole into which the protrusion stage of the quartz is inserted, closely attached to the quartz. A flange(110) is composed of the first concave part having the first and second holes and a protrusion part surrounding the first concave part, coupled to the outer wall of the chamber while the high frequency shield window is inserted into the first concave part. A detection part is inserted into the second hole of the first concave part. An EPD is connected to the other end of the detection part by an optic fiber.