发明名称 |
MAGNETIC TUNNEL JUNCTION IN MAGNETIC RANDOM ACCESS MEMORY DEVICE AND METHOD FOR FORMING THE SAME, ESPECIALLY CONTROLLING TiN AMOUNT REMAINING AFTER CHEMICAL MECHANICAL POLISHING |
摘要 |
PURPOSE: A magnetic tunnel junction in a magnetic random access memory device and a method for forming the same are provided to properly control the TiN amount remaining after the chemical mechanical polishing by forming the bottom electrode as a relatively low Ti-rich TiN. CONSTITUTION: A method for forming a magnetic tunnel junction in a magnetic random access memory device includes the steps of: forming a bottom electrode(100); forming an oxide layer(110) on the bottom electrode; and forming the magnetic tunnel junction(200). The magnetic tunnel is provided with a tunneling barrier(155a) grown in a direction equal to the maximum dense surface of the seed layer and a free layer(190) including at least two ferroelectric layers.
|
申请公布号 |
KR20050006830(A) |
申请公布日期 |
2005.01.17 |
申请号 |
KR20030046796 |
申请日期 |
2003.07.10 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
BAE, JUN SOO;BAEK, IN KYU;HA, YOUNG KI;KIM, HYUN JO;LEE, JANG EUN |
分类号 |
G11C11/15;G11C11/16;H01F10/32;H01F41/30;H01L43/08;H01L43/12;(IPC1-7):G11C11/15 |
主分类号 |
G11C11/15 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|