发明名称 MAGNETIC TUNNEL JUNCTION IN MAGNETIC RANDOM ACCESS MEMORY DEVICE AND METHOD FOR FORMING THE SAME, ESPECIALLY CONTROLLING TiN AMOUNT REMAINING AFTER CHEMICAL MECHANICAL POLISHING
摘要 PURPOSE: A magnetic tunnel junction in a magnetic random access memory device and a method for forming the same are provided to properly control the TiN amount remaining after the chemical mechanical polishing by forming the bottom electrode as a relatively low Ti-rich TiN. CONSTITUTION: A method for forming a magnetic tunnel junction in a magnetic random access memory device includes the steps of: forming a bottom electrode(100); forming an oxide layer(110) on the bottom electrode; and forming the magnetic tunnel junction(200). The magnetic tunnel is provided with a tunneling barrier(155a) grown in a direction equal to the maximum dense surface of the seed layer and a free layer(190) including at least two ferroelectric layers.
申请公布号 KR20050006830(A) 申请公布日期 2005.01.17
申请号 KR20030046796 申请日期 2003.07.10
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 BAE, JUN SOO;BAEK, IN KYU;HA, YOUNG KI;KIM, HYUN JO;LEE, JANG EUN
分类号 G11C11/15;G11C11/16;H01F10/32;H01F41/30;H01L43/08;H01L43/12;(IPC1-7):G11C11/15 主分类号 G11C11/15
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