| 摘要 |
A stabilizer mixture for one or more compounds of the general formula (1) and (1A) but preferably (1), wherein the groups R independently stand for an alkyl-, cycloalkyl-, aralkyl- or aryl-rest whereas the aromatic ring system may be optionally substituted by one or more groups R' which may be identical or different and which groups R' can be an aryl-, a saturated or unsaturated alkyl-, aralkyl- or cycloalkyl-group as well as halogen, an amino-, aminoalkyl-, aminocycloalkyl-, cyano-, thiocyano- or nitrogroup. and a UV-absorber, hindered amine stabilizer, sterically hindered phenol, organophosphite, organophosphonite, organophosphine, or mixtures thereof. The present invention is useful in the protection of various polymeric substrates against the damaging influence of light exposure by the long term storage of polymers. This effect can be observed especially in so-called engineering plastics (such as, for example, PC, PET, PBT, ABS, TPU).
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