METHOD AND APPARATUS OF ALIGNING WAFER FOR REDUCING PERIOD OF FORMING TEMPLATE PATTERN BY USING ONLY IMAGE DATA TO FORM TEMPLATE PATTERN

摘要

PURPOSE: A method and an apparatus of aligning a wafer are provided to reduce a period of forming a template pattern by using only image data to form the template pattern. CONSTITUTION: A first wafer is aligned to form a first template pattern corresponding to the first wafer(S100). Image data of a second wafer different from the first wafer are inputted(S200). A second template pattern corresponding to the second wafer is generated by using the image data of the second wafer(S300). The second wafer is aligned by using the second template pattern(S400).