| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
A lithographic apparatus in which alignment marks on the substrate are inspected during the exposure of the substrate to optimize the exposure conditions.
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| 申请公布号 |
US2005007572(A1) |
申请公布日期 |
2005.01.13 |
| 申请号 |
US20040853577 |
申请日期 |
2004.05.26 |
| 申请人 |
GEORGE RICHARD ALEXANDER;GUI CHENG-QUN;JAGER PIETER WILLEM HERMAN DE;LEEUWEN ROBBERT EDGAR VAN;BURGHOOM JACOBUS |
发明人 |
GEORGE RICHARD ALEXANDER;GUI CHENG-QUN;JAGER PIETER WILLEM HERMAN DE;LEEUWEN ROBBERT EDGAR VAN;BURGHOOM JACOBUS |
| 分类号 |
G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03B27/52 |
主分类号 |
G03F7/20 |
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