发明名称 Electrode assembly for electrochemical processing of workpiece
摘要 The present invention provides a novel system, apparatus, and method to deposit conductive films on a workpiece. A system for electroplating a surface of a workpiece using a process solution is disclosed. The system comprises a solution housing configured to house an electrode and to contain the process solution, a filter element disposed in the solution housing configured to partition the solution housing into a lower chamber and an upper chamber, and an upper inlet port coupled to the solution housing configured to deliver the process solution to the upper chamber of the solution housing to fill the upper chamber and the lower chamber immersing the electrode in the lower chamber.
申请公布号 US2005006244(A1) 申请公布日期 2005.01.13
申请号 US20030723045 申请日期 2003.11.26
申请人 UZOH CYPRIAN E.;BASOL BULENT M. 发明人 UZOH CYPRIAN E.;BASOL BULENT M.
分类号 C25D5/08;C25D7/12;C25D17/14;C25F7/00;H01L21/288;H01L21/321;H01L21/3213;H01L21/768;(IPC1-7):C25D5/20;C25D21/10 主分类号 C25D5/08
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