发明名称 |
Method for forming thin film pattern, device and production method therefor, electro-optical apparatus and electronic apparatus, and production method for active matrix substrate |
摘要 |
A method for forming a thin film pattern includes the step of ejecting a plurality of liquid droplets of a function liquid at predetermined pitches between banks, wherein each of the predetermined pitches is larger than a diameter of the liquid droplet and the predetermined pitches are set so that adjacent liquid droplets coalesce with each other when wetting and spreading within a groove formed between the banks.
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申请公布号 |
US2005005799(A1) |
申请公布日期 |
2005.01.13 |
申请号 |
US20040842563 |
申请日期 |
2004.05.11 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
HIRAI TOSHIMITSU |
分类号 |
G02F1/13;B05D1/26;B41M3/00;G02F1/1343;G03F7/00;G09F9/00;G09F9/30;H01L21/285;H01L21/3205;H01L21/336;H01L27/32;H01L29/786;H01L51/40;H01L51/50;H01L51/56;(IPC1-7):B41M1/00 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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