发明名称 Method for forming thin film pattern, device and production method therefor, electro-optical apparatus and electronic apparatus, and production method for active matrix substrate
摘要 A method for forming a thin film pattern includes the step of ejecting a plurality of liquid droplets of a function liquid at predetermined pitches between banks, wherein each of the predetermined pitches is larger than a diameter of the liquid droplet and the predetermined pitches are set so that adjacent liquid droplets coalesce with each other when wetting and spreading within a groove formed between the banks.
申请公布号 US2005005799(A1) 申请公布日期 2005.01.13
申请号 US20040842563 申请日期 2004.05.11
申请人 SEIKO EPSON CORPORATION 发明人 HIRAI TOSHIMITSU
分类号 G02F1/13;B05D1/26;B41M3/00;G02F1/1343;G03F7/00;G09F9/00;G09F9/30;H01L21/285;H01L21/3205;H01L21/336;H01L27/32;H01L29/786;H01L51/40;H01L51/50;H01L51/56;(IPC1-7):B41M1/00 主分类号 G02F1/13
代理机构 代理人
主权项
地址