发明名称 Method of preparing components, prepared component, lithographic apparatus and device manufacturing method
摘要 A method of preparing components for use in a vacuum chamber of a lithographic apparatus is disclosed. The method includes coating the component with a non-metallic material. The method may further include treating the coating so as to harden the coating. Preferably, the coating material is a hydrogen silsesquioxane (HSQ), which may be applied via spraying, brushing, or spinning and can be treated by heating or by irradiation with an electron beam. The resulting components strongly reduce outgassing of water and hydrocarbons when subjected to a vacuum environment.
申请公布号 US2005008978(A1) 申请公布日期 2005.01.13
申请号 US20040840508 申请日期 2004.05.07
申请人 ASML NETHERLANDS B.V. 发明人 DAMS JOHANNES ADRIANUS ANTONIUS THEODORUS;KROON MARK;VOORMA HARM-JAN;SPEE CAROLUS IDA MARIA ANTONIUS
分类号 G03F7/20;H01L21/027;(IPC1-7):G03C5/00 主分类号 G03F7/20
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