| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a dielectric element, prevented from the degradation of the reliability and yield, due to the deposition of conductive material onto a dielectric film and the sidewalls of a mask. SOLUTION: The method includes steps of, while rotating a dielectric element 200 provided with an ferrodielectric capacitor made up of a lower electrode 12, a ferrodielectric film 13 and an upper electrode 14, irradiating the surface of the upper electrode 14 with ions i through a mask 19 in an oblique direction at an angle in the range 0°<α<90°, and patterning the upper electrode 14 and the ferrodielectric film 13 by means of etching. COPYRIGHT: (C)2005,JPO&NCIPI
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