首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
CMP ABRASIVE, LIQUID ADDITIVE FOR CMP ABRASIVE AND METHOD FOR POLISHING SUBSTRATE
摘要
申请公布号
KR20050005499(A)
申请公布日期
2005.01.13
申请号
KR20047019184
申请日期
1999.12.22
申请人
发明人
分类号
C09K3/14;B24B37/00;B24B37/04;B24D3/34;B44C1/22;C09G1/02;C09K13/00;H01L21/302;H01L21/3105
主分类号
C09K3/14
代理机构
代理人
主权项
地址
您可能感兴趣的专利
ABSORBENT ARTICLE
GAME MACHINE
WASHING MACHINE
GAME MACHINE
GAME DEVICE AND GAME SYSTEM
METHODS FOR IDENTIFYING HOST CELL CLONES AND METHODS FOR PRODUCING ANTIBODY MIXTURES
TABLE
PAPER HUMIDIFYING DEVICE AND IMAGE FORMATION SYSTEM
DELIVERY SERVICE SYSTEM, DELIVERY SERVICE METHOD, SERVER FOR DELIVERY SERVICE, AND DELIVERER TERMINAL FOR DELIVERY SERVICE
AUXILIARY DRIVE UNIT OF ENGINE
PRINTED CIRCUIT BOARD, MANUFACTURING METHOD OF THE SAME, AND SEMICONDUCTOR PACKAGE INCLUDING THE SAME
OPTICAL EXTENSION REMOTE WIRELESS EQUIPMENT
SIGNAL GENERATION CIRCUIT
光ファイバーケーブル構成要素
COOLING SYSTEM, COOLING METHOD, AND INFORMATION PROCESSING SYSTEM
PARALLEL COMPUTER SYSTEM, PARALLEL CALCULATION METHOD AND PROGRAM
POWER SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING POWER SEMICONDUCTOR DEVICE
STRESS REDUCTION METHOD OF METAL FILM AND FILM FORMING METHOD OF METAL FILM
INFORMATION PROCESSING DEVICE, AND METHOD AND PROGRAM THEREOF
LIGHT-EMITTING DEVICE AND MANUFACTURING METHOD OF THE SAME