| 摘要 |
PROBLEM TO BE SOLVED: To obtain a lithographic device capable of easily providing data to individually controllable array-like elements, regardless of the size change of repeating unit of patterns exposed on a substrate. SOLUTION: The proportion of programmable patternization means used for the patternization of the substrate is restricted so as to allow the size of the repeating pattern, exposed to the substrate to be an integral number of times the size of the pattern exposed on the substrate by patternizing beams. COPYRIGHT: (C)2005,JPO&NCIPI
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