发明名称 |
ELECTRODE ASSEMBLY FOR ION IMPLANTING APPARATUS TO REDUCE CONTAMINATION OF ELECTRODE AND EXTEND LIFETIME OF ELECTRODE |
摘要 |
PURPOSE: An electrode assembly for an ion implanting apparatus is provided to reduce contamination of an electrode, and to extend the lifetime of the electrode by using the rest of the slits even if one of the slits is damaged. CONSTITUTION: A suppression electrode(110) has at least two slits of the same size. An extraction electrode(120) has at least two slits of the same size. The width of the slit of the suppression electrode is smaller than that of the extraction electrode. The slit has a proper width for an ion implantation process at ion implantation energy not higher than 20 kiloelectron volt.
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申请公布号 |
KR20050005306(A) |
申请公布日期 |
2005.01.13 |
申请号 |
KR20030044348 |
申请日期 |
2003.07.01 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
AN, GUM CHAN |
分类号 |
H01L21/265;(IPC1-7):H01L21/265 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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