发明名称 Lithographic apparatus, method of calibrating, and device manufacturing method
摘要 To calibrate a lithographic apparatus having a programmable patterning means, a sensor, such as a CCD, CMOS sensor or photo-diode array, having detector elements larger than the size of a spot corresponding to a single pixel of the programmable patterning means is used. Pixels are selectively activated singly or in groups.
申请公布号 US2005006563(A1) 申请公布日期 2005.01.13
申请号 US20040848583 申请日期 2004.05.19
申请人 MATHEUS BASELMANS JOHANNES JACOBUS;BLEEKER ARNO JAN 发明人 MATHEUS BASELMANS JOHANNES JACOBUS;BLEEKER ARNO JAN
分类号 G03F7/20;H01L21/027;(IPC1-7):G01N21/86 主分类号 G03F7/20
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