发明名称 |
Lithographic apparatus, method of calibrating, and device manufacturing method |
摘要 |
To calibrate a lithographic apparatus having a programmable patterning means, a sensor, such as a CCD, CMOS sensor or photo-diode array, having detector elements larger than the size of a spot corresponding to a single pixel of the programmable patterning means is used. Pixels are selectively activated singly or in groups.
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申请公布号 |
US2005006563(A1) |
申请公布日期 |
2005.01.13 |
申请号 |
US20040848583 |
申请日期 |
2004.05.19 |
申请人 |
MATHEUS BASELMANS JOHANNES JACOBUS;BLEEKER ARNO JAN |
发明人 |
MATHEUS BASELMANS JOHANNES JACOBUS;BLEEKER ARNO JAN |
分类号 |
G03F7/20;H01L21/027;(IPC1-7):G01N21/86 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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