DEVICE AND METHOD FOR PROCESSING A MASK PATTERN USED FOR THE PRODUCTION OF SEMICONDUCTORS

摘要

Disclosed are a device and a method for processing a mask pattern (10) used for the production of semiconductors. Said mask pattern (10) comprises a photomask (11) and a frame (20) that is spanned by a protective film (22) which is stuck to the photomask (11). The frame (20) is removed from the photomask (11). A support (50) for the mask pattern (10) and a heating device (54) that acts upon the mask pattern (10) are provided. A first, motor-operated device (64) grips the frame (20) while a second, motor-operated device (76) lifts the frame (20) from the photomask (11).