| 摘要 |
PROBLEM TO BE SOLVED: To improve the wraparound property of a cleaning gas while the dilution of the cleaning gas is made possible. SOLUTION: At the time of cleaning a film forming device, the cleaning gas G4 is introduced into an inner tube 2 through a cleaning gas introducing pipe 7d, and the flows of a gas introduced into an inert gas introducing pipe 7a and another gas introduced into an impurity supplying gas introducing pipe 7c are interrupted by respectively closing valves Va and Vc. COPYRIGHT: (C)2005,JPO&NCIPI
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