| 摘要 |
A thermal treatment process for improving the resistance of a flux grown, periodically poled KTiOPO4 crystal to photorefractive or photochromic damage comprising the steps of: i) heating said crystal from ambient temperature up to an annealing temperature in the range of from about 200° C. to about 400° C.; ii) maintaining said crystal at said annealing temperature in an oxygen containing atmosphere; iii) allowing said crystal to slowly cool down from said annealing temperature to ambient temperature.
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