发明名称 |
Complementary division mask, method of producing mask, and program |
摘要 |
A complementary division method able to suppress a pattern deformation by wet washing, having the steps of determining a definite division length able to suppress the pattern deformation when wet washing to a width and distance of a pattern that is assumed the pattern deformation over an elasticity limit is easiest given by wet washing in advance, dividing the entire line-and-space patterns at the determined division length in the longitudinal direction to divide suitably the line-and-space pattern by a simple algorithm, and further providing a method of producing a mask and program. |
申请公布号 |
US2005008948(A1) |
申请公布日期 |
2005.01.13 |
申请号 |
US20040885822 |
申请日期 |
2004.07.07 |
申请人 |
WATANABE YOKO;OMORI SHINJI |
发明人 |
WATANABE YOKO;OMORI SHINJI |
分类号 |
B08B3/04;G03F1/14;G03F1/16;G03F1/20;G03F1/68;G03F9/00;G06F17/50;H01L21/027;(IPC1-7):G03F9/00 |
主分类号 |
B08B3/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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