发明名称 PRESSURE REDUCTION PROCESS DEVICE, PRESSURE REDUCTION PROCESS METHOD, AND PRESSURE REGULATION VALVE
摘要 <p>A pressure reduction process device having no possibility of leakage at a valve provided in an air discharge path when the valve is closed and capable of reducing a load of maintenance work. On an air discharge tube (3) connected to a reaction tube (1) is provided a gate valve (4) for air-tightly closing the tube. A purge gas is jetted from jetting mouths, arranged along the circumferential direction in the valve seat and in the valve body, into a gap between a valve seat and a valve body in the gate valve. This prevents foreign objects originated from a process gas from adhering on those surfaces of the valve seat and the valve body that face the gap between the valve seat and valve body, improving sealing capability of the gate valve.</p>
申请公布号 WO2005004219(A1) 申请公布日期 2005.01.13
申请号 WO2004JP09440 申请日期 2004.07.02
申请人 TOKYO ELECTRON LIMITED;MATSUURA, HIROYUKI 发明人 MATSUURA, HIROYUKI
分类号 C23C16/44;F16K25/02;F16K51/02;H01L21/31;(IPC1-7):H01L21/31 主分类号 C23C16/44
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