发明名称 CAPACITOR, SEMICONDUCTOR DEVICE, CAPACITOR MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To suppress a short-circuiting of a capacitor electrode accompan a silicide process while suppressing an increase in the number of steps. SOLUTION: An upper electrode 2 is provided above a lower electrode 1 via a capacitance insulating film, the upper electrode 2 is positioned so that the electrode 2 extrudes at its full peripheral end from the lower electrode 1, and the lower electrode 1 is connected to a lower electrode terminal 3 via a connection 4. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005012079(A) 申请公布日期 2005.01.13
申请号 JP20030176412 申请日期 2003.06.20
申请人 SEIKO EPSON CORP 发明人 MATSUMOTO JUNJI
分类号 H01L27/04;H01L21/822;(IPC1-7):H01L21/822 主分类号 H01L27/04
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