发明名称 |
CAPACITOR, SEMICONDUCTOR DEVICE, CAPACITOR MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To suppress a short-circuiting of a capacitor electrode accompan a silicide process while suppressing an increase in the number of steps. SOLUTION: An upper electrode 2 is provided above a lower electrode 1 via a capacitance insulating film, the upper electrode 2 is positioned so that the electrode 2 extrudes at its full peripheral end from the lower electrode 1, and the lower electrode 1 is connected to a lower electrode terminal 3 via a connection 4. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005012079(A) |
申请公布日期 |
2005.01.13 |
申请号 |
JP20030176412 |
申请日期 |
2003.06.20 |
申请人 |
SEIKO EPSON CORP |
发明人 |
MATSUMOTO JUNJI |
分类号 |
H01L27/04;H01L21/822;(IPC1-7):H01L21/822 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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