| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface treatment method capable of forming a film which has excellent surface roughness and leaves no high residual stress in a base material while maintaining high adhesive force to the base material subjected to discharge surface treatment. SOLUTION: The surface treatment method comprises a discharge surface treatment step of forming a first film of a desired composition on a surface of a work 102 by the discharge surface treatment method, a flattening step of grinding or polishing the surface of the first film 105, and a film forming step of forming a second film 107 by a vapor phase epitaxial method or a plating method on the ground or polished first film 105. COPYRIGHT: (C)2005,JPO&NCIPI
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